Demonstration of Low-Power Three-Dimensional CMOS Inverters based on Si p-Tunnel FET and ITO n-FET

In this work, low-power CMOS inverter and 5-stage ring oscillator (RO) are demonstrated based on heterogeneous 3D integration of vertically stacked FEOL p-type silicon tunnel FET (TFET) and BEOL n-type indium-tin-oxide (ITO) FET. Owing to the low off-state current of both p-type and n-type FET, our...

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Veröffentlicht in:IEEE electron device letters 2025-01, p.1-1
Hauptverfasser: Tong, Anyu, Wang, Kaifeng, Hu, Qianlan, Wang, Zhiyu, Xiong, Xiong, Yan, Shiwei, Zhu, Shenwu, Li, Qijun, Wu, Yongqin, Ren, Ye, Bu, Weihai, Huang, Qianqian, Wu, Yanqing, Huang, Ru
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Sprache:eng
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Zusammenfassung:In this work, low-power CMOS inverter and 5-stage ring oscillator (RO) are demonstrated based on heterogeneous 3D integration of vertically stacked FEOL p-type silicon tunnel FET (TFET) and BEOL n-type indium-tin-oxide (ITO) FET. Owing to the low off-state current of both p-type and n-type FET, our ITO/TFET heterogeneous 3D integrated CMOS inverters show a low static power of 4.83 pW at V dd = 1 V and a high voltage gain of 522 V/V at V dd = 2.5 V, among the best values in reported amorphous oxide semiconductors (AOS) CMOS devices. Meanwhile, we also verified the functionality of logic circuits including 4T-SRAM cell and 5-stage RO based on our ITO/TFET heterogeneous 3D integrated CMOS inverters, and our 5-stage RO achieved a low propagation delay of 30 ns/stage, which is also the lowest value among AOS and TFET related CMOS devices.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2025.3528045