Wide-Range Threshold Voltage Tunable β-Ga₂O₃FETs With a Sputtered AlScN Ferroelectric Gate Dielectric

In this study, we demonstrate a \beta -Ga2O3 ferroelectric field-effect transistor (Fe-FET) using a sputtered aluminum scandium nitride (AlScN) gate dielectric. The device exhibits a steep subthreshold swing as low as 56 mV/dec with a high on/off ratio of \sim 10^{\mathbf {{8}}} and on-resistance...

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Veröffentlicht in:IEEE electron device letters 2024-09, Vol.45 (9), p.1558-1561
Hauptverfasser: Yoon Oh, Seung, Kim, Seokgi, Lee, Gyuhyung, Park, Ji-Hyeon, Jeon, Daewoo, Kim, Sungkyu, Yoo, Geonwook
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Sprache:eng
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Zusammenfassung:In this study, we demonstrate a \beta -Ga2O3 ferroelectric field-effect transistor (Fe-FET) using a sputtered aluminum scandium nitride (AlScN) gate dielectric. The device exhibits a steep subthreshold swing as low as 56 mV/dec with a high on/off ratio of \sim 10^{\mathbf {{8}}} and on-resistances of 201 and 185~\Omega \cdot mm for the polarization states. Furthermore, wide threshold voltage modulation from -23.4 to 3.5 V is achieved via gate pulses. Finally, retention and endurance tests show stable depletion (D-) and enhancement (E-) mode switching for up to 10,000 cycles. These results suggest the potential of the proposed \beta -Ga2O3 Fe-FET with AlScN gate structure for monolithic integration of \beta -Ga2O3 NMOS logic circuits.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2024.3425439