Charge Transport Mechanism in p-Channel Tin Monoxide Thin-Film Transistors

In this letter, we report on the charge transport mechanism in the p-type tin monoxide (SnO) thin-film transistors (TFTs) over a wide range of operation regimes and temperatures. From the temperature-dependent field-effect conductance measurements, the variable range hopping and the trap-limited ban...

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Veröffentlicht in:IEEE electron device letters 2017-04, Vol.38 (4), p.473-476
Hauptverfasser: Kim, Hee-Joong, Jeong, Chan-Yong, Bae, Sang-Dae, Lee, Jeong-Hwan, Kwon, Hyuck-In
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Sprache:eng
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Zusammenfassung:In this letter, we report on the charge transport mechanism in the p-type tin monoxide (SnO) thin-film transistors (TFTs) over a wide range of operation regimes and temperatures. From the temperature-dependent field-effect conductance measurements, the variable range hopping and the trap-limited band transport are considered as dominant charge transport mechanisms in the SnO TFT at temperatures below ~ 200 K (-73 °C) and above ~273 K (0 °C), respectively, in the subthreshold and transition regions. In the above-threshold region, the intrinsic field-effect mobility (μFEi) decreases with an increase in temperature with a prefactor y ~-0.36 in the μFEi ~ T y law at temperatures (Ts) between RT and 353 K (80 °C). The observed temperature and gate overdrive voltage dependence of μFEi suggests that the acoustic phonon scattering is the dominant physical mechanism limiting μFEi in the p-type SnO TFT at realistic operating conditions [in the above-threshold region and at temperatures ranging from RT to 353 K (80 °C)].
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2017.2672730