Quaternary Barrier InAlGaN HEMTs With f/f of 230/300 GHz

Depletion-mode quaternary barrier In 0.13 Al 0.83 Ga 0.04 N high-electron-mobility transistors (HEMTs) with regrown ohmic contacts and T-gates on a SiC substrate have been fabricated. Devices with 40-nm-long footprints show a maximum output current density of 1.8 A/mm, an extrinsic dc transconductan...

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Veröffentlicht in:IEEE electron device letters 2013-03, Vol.34 (3), p.378-380
Hauptverfasser: Ronghua Wang, Guowang Li, Karbasian, G., Jia Guo, Bo Song, Yuanzheng Yue, Zongyang Hu, Laboutin, O., Yu Cao, Johnson, W., Snider, G., Fay, P., Jena, D., Xing, H. G.
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container_end_page 380
container_issue 3
container_start_page 378
container_title IEEE electron device letters
container_volume 34
creator Ronghua Wang
Guowang Li
Karbasian, G.
Jia Guo
Bo Song
Yuanzheng Yue
Zongyang Hu
Laboutin, O.
Yu Cao
Johnson, W.
Snider, G.
Fay, P.
Jena, D.
Xing, H. G.
description Depletion-mode quaternary barrier In 0.13 Al 0.83 Ga 0.04 N high-electron-mobility transistors (HEMTs) with regrown ohmic contacts and T-gates on a SiC substrate have been fabricated. Devices with 40-nm-long footprints show a maximum output current density of 1.8 A/mm, an extrinsic dc transconductance of 770 mS/mm, and cutoff frequencies fT / f max of 230/300 GHz at the same bias, which give a record-high value of √ fT · f max = 263 GHz among all reported InAl(Ga)N barrier HEMTs. The device speed shows good scalability with gate length despite the onset of short-channel effects due to the lack of a back barrier. An effective electron velocity of 1.36 ×10 7 cm/s, which is comparable with that in the state-of-the-art deeply scaled AlN/GaN HEMTs, has been extracted from the gate-length dependence of fT for gate lengths from 100 to 40 nm.
doi_str_mv 10.1109/LED.2013.2238503
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The device speed shows good scalability with gate length despite the onset of short-channel effects due to the lack of a back barrier. An effective electron velocity of 1.36 ×10 7 cm/s, which is comparable with that in the state-of-the-art deeply scaled AlN/GaN HEMTs, has been extracted from the gate-length dependence of fT for gate lengths from 100 to 40 nm.</abstract><pub>IEEE</pub><doi>10.1109/LED.2013.2238503</doi><tpages>3</tpages><oa>free_for_read</oa></addata></record>
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subjects Cutoff frequency
Delay
electron velocity
Gallium nitride
HEMTs
HFET
high-electron-mobility transistor (HEMT)
Logic gates
mobility
MODFETs
Ohmic contacts
quaternary
regrown ohmic contact
T-gate
title Quaternary Barrier InAlGaN HEMTs With f/f of 230/300 GHz
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