Quaternary Barrier InAlGaN HEMTs With f/f of 230/300 GHz

Depletion-mode quaternary barrier In 0.13 Al 0.83 Ga 0.04 N high-electron-mobility transistors (HEMTs) with regrown ohmic contacts and T-gates on a SiC substrate have been fabricated. Devices with 40-nm-long footprints show a maximum output current density of 1.8 A/mm, an extrinsic dc transconductan...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE electron device letters 2013-03, Vol.34 (3), p.378-380
Hauptverfasser: Ronghua Wang, Guowang Li, Karbasian, G., Jia Guo, Bo Song, Yuanzheng Yue, Zongyang Hu, Laboutin, O., Yu Cao, Johnson, W., Snider, G., Fay, P., Jena, D., Xing, H. G.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Depletion-mode quaternary barrier In 0.13 Al 0.83 Ga 0.04 N high-electron-mobility transistors (HEMTs) with regrown ohmic contacts and T-gates on a SiC substrate have been fabricated. Devices with 40-nm-long footprints show a maximum output current density of 1.8 A/mm, an extrinsic dc transconductance of 770 mS/mm, and cutoff frequencies fT / f max of 230/300 GHz at the same bias, which give a record-high value of √ fT · f max = 263 GHz among all reported InAl(Ga)N barrier HEMTs. The device speed shows good scalability with gate length despite the onset of short-channel effects due to the lack of a back barrier. An effective electron velocity of 1.36 ×10 7 cm/s, which is comparable with that in the state-of-the-art deeply scaled AlN/GaN HEMTs, has been extracted from the gate-length dependence of fT for gate lengths from 100 to 40 nm.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2013.2238503