Low-Temperature Reflow Anneals of Cu on Ru

Low-Temperature Reflow Anneals of Cu on Ru

Low-temperature reflow anneals of physical-vapor-deposited (PVD) Cu on Ru are achieved at a Cu/low- k integration-compatible low temperature of 250°C by surface diffusion. Feature-fill capability is also demonstrated in patterned features along with reasonable electrical measurements. As compared to...

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Veröffentlicht in:IEEE electron device letters 2011-06, Vol.32 (6), p.806-808
Hauptverfasser: Yang, C.-C, McFeely, F R, Li, B, Rosenberg, R, Edelstein, D
Format: Artikel
Sprache:eng
Schlagworte:
Annealing
Applied sciences
Copper
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Design. Technologies. Operation analysis. Testing
Devices
Electrical measurement
Electrical resistance
Electrical resistance measurement
Electromigration
electromigration (EM)
Electronic equipment and fabrication. Passive components, printed wiring boards, connectics
Electronics
Exact sciences and technology
Impurities
Integrated circuit interconnections
Integrated circuits
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Microelectronic fabrication (materials and surfaces technology)
Physical vapor deposition
Physics
Reliability
Resistance
ruthenium
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Substrates
surface diffusion
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Beschreibung
Zusammenfassung:Low-temperature reflow anneals of physical-vapor-deposited (PVD) Cu on Ru are achieved at a Cu/low- k integration-compatible low temperature of 250°C by surface diffusion. Feature-fill capability is also demonstrated in patterned features along with reasonable electrical measurements. As compared to typical impurity levels in the conventional electroplated Cu, the reflowed PVD Cu had higher purity, which then resulted in lower electrical resistance in the structures. Electromigration test results further confirmed the reliability of the reflowed-Cu/Ru interface.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2011.2132691