A 5-V operated MEMS variable optical attenuator by SOI bulk micromachining

We report the design, fabrication, and successful demonstration of microelectromechanical variable optical attenuator (VOA) using an electrostatic microtorsion mirror (0.6 mm in diameter) combined with a fiber-optic collimator. The VOA operates at low voltages (dc 5 V or less) for large optical atte...

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Veröffentlicht in:IEEE journal of selected topics in quantum electronics 2004-05, Vol.10 (3), p.570-578
Hauptverfasser: Isamoto, K., Kato, K., Morosawa, A., Changho Chong, Fujita, H., Toshiyoshi, H.
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Sprache:eng
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Zusammenfassung:We report the design, fabrication, and successful demonstration of microelectromechanical variable optical attenuator (VOA) using an electrostatic microtorsion mirror (0.6 mm in diameter) combined with a fiber-optic collimator. The VOA operates at low voltages (dc 5 V or less) for large optical attenuation (40 dB, corresponding to mirror angle of 0.3/spl deg/) and a fast response time (5 ms or faster). The mirror made of a bulk-micromachined silicon-on-insulator wafer has been designed to be shock resistant up to 500 G without any mechanical failure. We also have suppressed temperature dependence of optical performance to be less than /spl plusmn/0.5 dB at 10-dB attenuation in the range of -5/spl deg/C-70/spl deg/C by mechanically decoupling the parasitic bimorph effect from the electrostatic operation.
ISSN:1077-260X
1558-4542
DOI:10.1109/JSTQE.2004.828475