Mosfet Scaling-the Driver of VLSI Technology
This is an introduction to the Classic Paper on MOSFET scaling by R. Dennard et al., 'Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions,' published in the IEEE Journal of Solid-State Circuits in October 1974. The history of scaling and its application to very large...
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Veröffentlicht in: | Proceedings of the IEEE 1999-04, Vol.87 (4), p.659-667 |
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description | This is an introduction to the Classic Paper on MOSFET scaling by R. Dennard et al., 'Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions,' published in the IEEE Journal of Solid-State Circuits in October 1974. The history of scaling and its application to very large scale integration (VLSI) MOSFET technology is traced from 1970 to 1998. The role of scaling in the profound improvements in power delay product over the last three decades is analyzed in basic terms. |
doi_str_mv | 10.1109/JPROC.1999.752521 |
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Dennard et al., 'Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions,' published in the IEEE Journal of Solid-State Circuits in October 1974. The history of scaling and its application to very large scale integration (VLSI) MOSFET technology is traced from 1970 to 1998. The role of scaling in the profound improvements in power delay product over the last three decades is analyzed in basic terms.</description><identifier>ISSN: 0018-9219</identifier><identifier>EISSN: 1558-2256</identifier><identifier>DOI: 10.1109/JPROC.1999.752521</identifier><identifier>CODEN: IEEPAD</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; CMOS integrated circuits ; CMOS technology ; Delay ; Design. Technologies. Operation analysis. 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Dennard et al., 'Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions,' published in the IEEE Journal of Solid-State Circuits in October 1974. The history of scaling and its application to very large scale integration (VLSI) MOSFET technology is traced from 1970 to 1998. The role of scaling in the profound improvements in power delay product over the last three decades is analyzed in basic terms.</description><subject>Applied sciences</subject><subject>CMOS integrated circuits</subject><subject>CMOS technology</subject><subject>Delay</subject><subject>Design. Technologies. Operation analysis. Testing</subject><subject>Driver circuits</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>History</subject><subject>Integrated circuit technology</subject><subject>Integrated circuits</subject><subject>Logic</subject><subject>MOSFET circuits</subject><subject>Paper technology</subject><subject>Semiconductor electronics. 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Technologies. Operation analysis. Testing</topic><topic>Driver circuits</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>History</topic><topic>Integrated circuit technology</topic><topic>Integrated circuits</topic><topic>Logic</topic><topic>MOSFET circuits</topic><topic>Paper technology</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. 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subjects | Applied sciences CMOS integrated circuits CMOS technology Delay Design. Technologies. Operation analysis. Testing Driver circuits Electronics Exact sciences and technology History Integrated circuit technology Integrated circuits Logic MOSFET circuits Paper technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Very large scale integration |
title | Mosfet Scaling-the Driver of VLSI Technology |
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