Mosfet Scaling-the Driver of VLSI Technology

Mosfet Scaling-the Driver of VLSI Technology

This is an introduction to the Classic Paper on MOSFET scaling by R. Dennard et al., 'Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions,' published in the IEEE Journal of Solid-State Circuits in October 1974. The history of scaling and its application to very large...

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Veröffentlicht in:Proceedings of the IEEE 1999-04, Vol.87 (4), p.659-667
1. Verfasser: Critchlow, D.L.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
CMOS integrated circuits
CMOS technology
Delay
Design. Technologies. Operation analysis. Testing
Driver circuits
Electronics
Exact sciences and technology
History
Integrated circuit technology
Integrated circuits
Logic
MOSFET circuits
Paper technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Very large scale integration
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Beschreibung
Zusammenfassung:This is an introduction to the Classic Paper on MOSFET scaling by R. Dennard et al., 'Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions,' published in the IEEE Journal of Solid-State Circuits in October 1974. The history of scaling and its application to very large scale integration (VLSI) MOSFET technology is traced from 1970 to 1998. The role of scaling in the profound improvements in power delay product over the last three decades is analyzed in basic terms.
ISSN:0018-9219
1558-2256
DOI:10.1109/JPROC.1999.752521