Study of High Aspect Ratio NLD Plasma Etching and Postprocessing of Fused Silica and Borosilicate Glass

Study of High Aspect Ratio NLD Plasma Etching and Postprocessing of Fused Silica and Borosilicate Glass

In this paper, we report magnetic neutral loop discharge (NLD) plasma etching of fused silica (FS) and borosilicate glass (BSG), demonstrating high aspect ratio deep etch (100 μm) with vertical walls (

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Veröffentlicht in:Journal of microelectromechanical systems 2015-08, Vol.24 (4), p.790-800
Hauptverfasser: Ahamed, Mohammed J., Senkal, Doruk, Trusov, Alexander A., Shkel, Andrei M.
Format: Artikel
Sprache:eng
Schlagworte:
Antennas
Etching
fused quartz
fused silica
Glass
glass etching
Microfabrication
Nickel
plasma etching
Plasmas
Resists
roughness reduction
Silicon
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Zusammenfassung:In this paper, we report magnetic neutral loop discharge (NLD) plasma etching of fused silica (FS) and borosilicate glass (BSG), demonstrating high aspect ratio deep etch (100 μm) with vertical walls (
ISSN:1057-7157
1941-0158
DOI:10.1109/JMEMS.2015.2442596