Time-Domain Characterization of Photonic Integrated Filters Subject to Fabrication Variations

Fabrication variations are a key factor to degrade the performance of photonic integrated circuits (PICs), and especially wavelength filters. We propose an efficient modeling approach to quantify the effects of fabrication variations on the time-domain performance of linear passive photonic integrat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of lightwave technology 2019-11, Vol.37 (21), p.5561-5570
Hauptverfasser: Ye, Yinghao, Wang, Mi, Spina, Domenico, Bogaerts, Wim, Dhaene, Tom
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Fabrication variations are a key factor to degrade the performance of photonic integrated circuits (PICs), and especially wavelength filters. We propose an efficient modeling approach to quantify the effects of fabrication variations on the time-domain performance of linear passive photonic integrated circuits (including the wavelength filters) in the design stage, before fabrication. In particular, this novel approach conjugates the accuracy of the Polynomial Chaos (PC) expansion in describing stochastic variations and the efficiency of a Vector Fitting (VF)-based baseband modeling technique in performing time-domain simulations. A suitable example validates the performance of the proposed method.
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2019.2933311