Planarization of gold and aluminum thin films using a pulsed laser

Micrometer-thick gold and aluminum films have been planarized by momentarily melting them with optical pulses from a dye laser. Submicrosecond pulses were used in order to minimize the temperature rise in the substrate, reduce the energy required for melting, and prevent undesirable metallurgical re...

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Veröffentlicht in:	IEEE electron device letters 1986-01, Vol.7 (1), p.1-4
Hauptverfasser:	Tuckerman, D.B., Weisberg, A.H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Applied sciences Electronics Exact sciences and technology Gold Insulation Integrated circuit metallization Microelectronic fabrication (materials and surfaces technology) Optical films Optical pulses Planarization Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicon Temperature Transistors
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