Visible-laser repair of clear defects in photomasks
A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming...
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| Veröffentlicht in: | IEEE electron device letters 1985-07, Vol.6 (7), p.344-346 |
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| container_end_page | 346 |
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| container_issue | 7 |
| container_start_page | 344 |
| container_title | IEEE electron device letters |
| container_volume | 6 |
| creator | Oprysko, M.M. Beranek, M.W. Young, P.L. |
| description | A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved. |
| doi_str_mv | 10.1109/EDL.1985.26149 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_crossref_primary_10_1109_EDL_1985_26149</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1485302</ieee_id><sourcerecordid>28760629</sourcerecordid><originalsourceid>FETCH-LOGICAL-c348t-4c52fd2416a032f3da4619c05559eba854e2a730b5ab544de64c78da545a32823</originalsourceid><addsrcrecordid>eNqFkDtPwzAURi0EEqWwsrBkQGwJflw7zohKeUiVWIDVunFuhCFtgp0O_HtaWsHI9C3nO8Nh7FzwQgheXc9vF4WorC6kEVAdsInQ2uZcG3XIJrwEkSvBzTE7SemdcwFQwoSp15BC3VHeYaKYRRowxKxvM98RxqyhlvyYsrDKhrd-7JeYPtIpO2qxS3S23yl7uZs_zx7yxdP94-xmkXsFdszBa9k2EoRBrmSrGgQjKs-11hXVaDWQxFLxWmOtARoy4EvboAaNSlqppuxq5x1i_7mmNLplSJ66DlfUr5OTtjTcyOp_EKypQG3BYgf62KcUqXVDDEuMX05wt43oNhHdNqL7ibg5XO7NmDx2bcSVD-n3ZUHq0poNdrHDAhH9OcFqxaX6Bqk9eEE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>24869439</pqid></control><display><type>article</type><title>Visible-laser repair of clear defects in photomasks</title><source>IEEE Electronic Library (IEL)</source><creator>Oprysko, M.M. ; Beranek, M.W. ; Young, P.L.</creator><creatorcontrib>Oprysko, M.M. ; Beranek, M.W. ; Young, P.L.</creatorcontrib><description>A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved.</description><identifier>ISSN: 0741-3106</identifier><identifier>EISSN: 1558-0563</identifier><identifier>DOI: 10.1109/EDL.1985.26149</identifier><identifier>CODEN: EDLEDZ</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Argon ; Electronics ; Exact sciences and technology ; Gas lasers ; Laser beams ; Laser modes ; Laser theory ; Microelectronic fabrication (materials and surfaces technology) ; Optical films ; Optical surface waves ; Power lasers ; Pulsed laser deposition ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Substrates</subject><ispartof>IEEE electron device letters, 1985-07, Vol.6 (7), p.344-346</ispartof><rights>1986 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c348t-4c52fd2416a032f3da4619c05559eba854e2a730b5ab544de64c78da545a32823</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1485302$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1485302$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8425786$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Oprysko, M.M.</creatorcontrib><creatorcontrib>Beranek, M.W.</creatorcontrib><creatorcontrib>Young, P.L.</creatorcontrib><title>Visible-laser repair of clear defects in photomasks</title><title>IEEE electron device letters</title><addtitle>LED</addtitle><description>A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved.</description><subject>Applied sciences</subject><subject>Argon</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Gas lasers</subject><subject>Laser beams</subject><subject>Laser modes</subject><subject>Laser theory</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Optical films</subject><subject>Optical surface waves</subject><subject>Power lasers</subject><subject>Pulsed laser deposition</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Substrates</subject><issn>0741-3106</issn><issn>1558-0563</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1985</creationdate><recordtype>article</recordtype><recordid>eNqFkDtPwzAURi0EEqWwsrBkQGwJflw7zohKeUiVWIDVunFuhCFtgp0O_HtaWsHI9C3nO8Nh7FzwQgheXc9vF4WorC6kEVAdsInQ2uZcG3XIJrwEkSvBzTE7SemdcwFQwoSp15BC3VHeYaKYRRowxKxvM98RxqyhlvyYsrDKhrd-7JeYPtIpO2qxS3S23yl7uZs_zx7yxdP94-xmkXsFdszBa9k2EoRBrmSrGgQjKs-11hXVaDWQxFLxWmOtARoy4EvboAaNSlqppuxq5x1i_7mmNLplSJ66DlfUr5OTtjTcyOp_EKypQG3BYgf62KcUqXVDDEuMX05wt43oNhHdNqL7ibg5XO7NmDx2bcSVD-n3ZUHq0poNdrHDAhH9OcFqxaX6Bqk9eEE</recordid><startdate>19850701</startdate><enddate>19850701</enddate><creator>Oprysko, M.M.</creator><creator>Beranek, M.W.</creator><creator>Young, P.L.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19850701</creationdate><title>Visible-laser repair of clear defects in photomasks</title><author>Oprysko, M.M. ; Beranek, M.W. ; Young, P.L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c348t-4c52fd2416a032f3da4619c05559eba854e2a730b5ab544de64c78da545a32823</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1985</creationdate><topic>Applied sciences</topic><topic>Argon</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Gas lasers</topic><topic>Laser beams</topic><topic>Laser modes</topic><topic>Laser theory</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Optical films</topic><topic>Optical surface waves</topic><topic>Power lasers</topic><topic>Pulsed laser deposition</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Substrates</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Oprysko, M.M.</creatorcontrib><creatorcontrib>Beranek, M.W.</creatorcontrib><creatorcontrib>Young, P.L.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE electron device letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Oprysko, M.M.</au><au>Beranek, M.W.</au><au>Young, P.L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Visible-laser repair of clear defects in photomasks</atitle><jtitle>IEEE electron device letters</jtitle><stitle>LED</stitle><date>1985-07-01</date><risdate>1985</risdate><volume>6</volume><issue>7</issue><spage>344</spage><epage>346</epage><pages>344-346</pages><issn>0741-3106</issn><eissn>1558-0563</eissn><coden>EDLEDZ</coden><abstract>A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/EDL.1985.26149</doi><tpages>3</tpages></addata></record> |
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| identifier | ISSN: 0741-3106 |
| ispartof | IEEE electron device letters, 1985-07, Vol.6 (7), p.344-346 |
| issn | 0741-3106 1558-0563 |
| language | eng |
| recordid | cdi_crossref_primary_10_1109_EDL_1985_26149 |
| source | IEEE Electronic Library (IEL) |
| subjects | Applied sciences Argon Electronics Exact sciences and technology Gas lasers Laser beams Laser modes Laser theory Microelectronic fabrication (materials and surfaces technology) Optical films Optical surface waves Power lasers Pulsed laser deposition Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Substrates |
| title | Visible-laser repair of clear defects in photomasks |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T21%3A52%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Visible-laser%20repair%20of%20clear%20defects%20in%20photomasks&rft.jtitle=IEEE%20electron%20device%20letters&rft.au=Oprysko,%20M.M.&rft.date=1985-07-01&rft.volume=6&rft.issue=7&rft.spage=344&rft.epage=346&rft.pages=344-346&rft.issn=0741-3106&rft.eissn=1558-0563&rft.coden=EDLEDZ&rft_id=info:doi/10.1109/EDL.1985.26149&rft_dat=%3Cproquest_RIE%3E28760629%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=24869439&rft_id=info:pmid/&rft_ieee_id=1485302&rfr_iscdi=true |