Visible-laser repair of clear defects in photomasks

A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming...

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Veröffentlicht in:	IEEE electron device letters 1985-07, Vol.6 (7), p.344-346
Hauptverfasser:	Oprysko, M.M., Beranek, M.W., Young, P.L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Argon Electronics Exact sciences and technology Gas lasers Laser beams Laser modes Laser theory Microelectronic fabrication (materials and surfaces technology) Optical films Optical surface waves Power lasers Pulsed laser deposition Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Substrates
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Beschreibung
Zusammenfassung:	A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved.
ISSN:	0741-3106 1558-0563
DOI:	10.1109/EDL.1985.26149