Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates
YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evapor...
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| Veröffentlicht in: | IEEE transactions on applied superconductivity 1999-06, Vol.9 (2), p.1523-1526 |
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| container_title | IEEE transactions on applied superconductivity |
| container_volume | 9 |
| creator | Selvamanickam, V. Galinski, G. DeFrank, J. Trautwein, C. Haldar, P. Balachandran, U. Lanagan, M. Chudzik, M. |
| description | YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates. |
| doi_str_mv | 10.1109/77.784683 |
| format | Article |
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Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.</description><identifier>ISSN: 1051-8223</identifier><identifier>EISSN: 1558-2515</identifier><identifier>DOI: 10.1109/77.784683</identifier><identifier>CODEN: ITASE9</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Buffer layers ; Chemical vapor deposition ; Critical current density ; Electronics ; Exact sciences and technology ; Ion beams ; Microelectronic fabrication (materials and surfaces technology) ; MOCVD ; Nickel alloys ; Organic chemicals ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Substrates ; Thermomechanical processes ; Yttrium barium copper oxide</subject><ispartof>IEEE transactions on applied superconductivity, 1999-06, Vol.9 (2), p.1523-1526</ispartof><rights>1999 INIST-CNRS</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c335t-1eb98b823a2ffaf88bce8cd8a8844a2682096764a1cccbbfbfa9cb46b6dbfe53</citedby><cites>FETCH-LOGICAL-c335t-1eb98b823a2ffaf88bce8cd8a8844a2682096764a1cccbbfbfa9cb46b6dbfe53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/784683$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,796,23930,23931,25140,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/784683$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1933758$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Selvamanickam, V.</creatorcontrib><creatorcontrib>Galinski, G.</creatorcontrib><creatorcontrib>DeFrank, J.</creatorcontrib><creatorcontrib>Trautwein, C.</creatorcontrib><creatorcontrib>Haldar, P.</creatorcontrib><creatorcontrib>Balachandran, U.</creatorcontrib><creatorcontrib>Lanagan, M.</creatorcontrib><creatorcontrib>Chudzik, M.</creatorcontrib><title>Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates</title><title>IEEE transactions on applied superconductivity</title><addtitle>TASC</addtitle><description>YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.</description><subject>Applied sciences</subject><subject>Buffer layers</subject><subject>Chemical vapor deposition</subject><subject>Critical current density</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Ion beams</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>MOCVD</subject><subject>Nickel alloys</subject><subject>Organic chemicals</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Substrates</subject><subject>Thermomechanical processes</subject><subject>Yttrium barium copper oxide</subject><issn>1051-8223</issn><issn>1558-2515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqN0T1PwzAQBuAIgUQpDKxMGRASQ0rs-OMyQsWXVKlLF6bo7J7BKGmKnSD135OqFTB2Ouv83DvcJcklyyeM5eWd1hMNQkFxlIyYlJBxyeTx8M4ly4Dz4jQ5i_Ezz5kAIUcJvmUPmE37bJ46XzfpktZt9J1vV6nZpA11WKdteMeVt6n9oMbbofGN6zb8p1vdO0eBlvuZ2JvYBewonicnDutIF_s6ThZPj4vpSzabP79O72eZLQrZZYxMCQZ4gdw5dADGEtglIIAQyBXwvFRaCWTWWmOccVhaI5RRS-NIFuPkZhe7Du1XT7GrGh8t1TWuqO1jxQFACqUOgFoorg-AmpWa51t4u4M2tDEGctU6-AbDpmJ5tb1KpXW1u8pgr_ehGIdVuoAr6-PfQFkUWsLArnbME9Hv7z7jB76blYA</recordid><startdate>19990601</startdate><enddate>19990601</enddate><creator>Selvamanickam, V.</creator><creator>Galinski, G.</creator><creator>DeFrank, J.</creator><creator>Trautwein, C.</creator><creator>Haldar, P.</creator><creator>Balachandran, U.</creator><creator>Lanagan, M.</creator><creator>Chudzik, M.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>7QQ</scope><scope>JG9</scope></search><sort><creationdate>19990601</creationdate><title>Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates</title><author>Selvamanickam, V. ; Galinski, G. ; DeFrank, J. ; Trautwein, C. ; Haldar, P. ; Balachandran, U. ; Lanagan, M. ; Chudzik, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c335t-1eb98b823a2ffaf88bce8cd8a8844a2682096764a1cccbbfbfa9cb46b6dbfe53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Applied sciences</topic><topic>Buffer layers</topic><topic>Chemical vapor deposition</topic><topic>Critical current density</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Ion beams</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>MOCVD</topic><topic>Nickel alloys</topic><topic>Organic chemicals</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Substrates</topic><topic>Thermomechanical processes</topic><topic>Yttrium barium copper oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Selvamanickam, V.</creatorcontrib><creatorcontrib>Galinski, G.</creatorcontrib><creatorcontrib>DeFrank, J.</creatorcontrib><creatorcontrib>Trautwein, C.</creatorcontrib><creatorcontrib>Haldar, P.</creatorcontrib><creatorcontrib>Balachandran, U.</creatorcontrib><creatorcontrib>Lanagan, M.</creatorcontrib><creatorcontrib>Chudzik, M.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Ceramic Abstracts</collection><collection>Materials Research Database</collection><jtitle>IEEE transactions on applied superconductivity</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Selvamanickam, V.</au><au>Galinski, G.</au><au>DeFrank, J.</au><au>Trautwein, C.</au><au>Haldar, P.</au><au>Balachandran, U.</au><au>Lanagan, M.</au><au>Chudzik, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates</atitle><jtitle>IEEE transactions on applied superconductivity</jtitle><stitle>TASC</stitle><date>1999-06-01</date><risdate>1999</risdate><volume>9</volume><issue>2</issue><spage>1523</spage><epage>1526</epage><pages>1523-1526</pages><issn>1051-8223</issn><eissn>1558-2515</eissn><coden>ITASE9</coden><abstract>YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/77.784683</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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| identifier | ISSN: 1051-8223 |
| ispartof | IEEE transactions on applied superconductivity, 1999-06, Vol.9 (2), p.1523-1526 |
| issn | 1051-8223 1558-2515 |
| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | Applied sciences Buffer layers Chemical vapor deposition Critical current density Electronics Exact sciences and technology Ion beams Microelectronic fabrication (materials and surfaces technology) MOCVD Nickel alloys Organic chemicals Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Substrates Thermomechanical processes Yttrium barium copper oxide |
| title | Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates |
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