Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates

YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evapor...

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Veröffentlicht in:	IEEE transactions on applied superconductivity 1999-06, Vol.9 (2), p.1523-1526
Hauptverfasser:	Selvamanickam, V., Galinski, G., DeFrank, J., Trautwein, C., Haldar, P., Balachandran, U., Lanagan, M., Chudzik, M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Buffer layers Chemical vapor deposition Critical current density Electronics Exact sciences and technology Ion beams Microelectronic fabrication (materials and surfaces technology) MOCVD Nickel alloys Organic chemicals Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Substrates Thermomechanical processes Yttrium barium copper oxide
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Beschreibung
Zusammenfassung:	YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.
ISSN:	1051-8223 1558-2515
DOI:	10.1109/77.784683