Monolithic integration of 1.3-/spl mu/m Stark-ladder electroabsorption waveguide modulators with multimode-interference splitters
In this letter, we describe a novel fabrication process for the monolithic integration of a waveguide power splitter based on the multimode-interference effect with multiple-quantum well (MQW) electroabsorption modulators based on the Stark-ladder effect. The integrated device is fabricated by a one...
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Veröffentlicht in: | IEEE photonics technology letters 2000-06, Vol.12 (6), p.657-659 |
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creator | Harrison, L.J. Tayag, T.J. Simonis, G.J. Stead, M. Euliss, G.W. Leavitt, R.P. |
description | In this letter, we describe a novel fabrication process for the monolithic integration of a waveguide power splitter based on the multimode-interference effect with multiple-quantum well (MQW) electroabsorption modulators based on the Stark-ladder effect. The integrated device is fabricated by a one-step epitaxy process using molecular-beam-epitaxy growth and three lithographic steps that eliminates the need for aligned regrowth of the MQW modulator. Experimental results of the modulation depth and wavelength dependence are also reported. |
doi_str_mv | 10.1109/68.849075 |
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The integrated device is fabricated by a one-step epitaxy process using molecular-beam-epitaxy growth and three lithographic steps that eliminates the need for aligned regrowth of the MQW modulator. Experimental results of the modulation depth and wavelength dependence are also reported.</description><subject>Absorption</subject><subject>Etching</subject><subject>Integrated optics</subject><subject>Monolithic integrated circuits</subject><subject>Optical beams</subject><subject>Optical modulation</subject><subject>Optical waveguides</subject><subject>Photonic band gap</subject><subject>Propagation losses</subject><subject>Quantum well devices</subject><issn>1041-1135</issn><issn>1941-0174</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kD1PwzAQhi0EEqUwsDJ5ZUhrx3ZSj6jiSypioHt0cc7FkNSV7VIx8s9xacV079099wxHyDVnE86ZnlazyUxqVqsTMuJa8oLxWp7mzHLmXKhzchHjB2NcKiFH5OfFr33v0rsz1K0TrgIk59fUW8onopjGTU-H7XSgbwnCZ9FD12Gg2KNJwUMbfdj88Tv4wtXWdUgH3217SD5EusvefN0nl4dY7P3BYsC1QZrFLuU-XpIzC33Eq2Mdk-XD_XL-VCxeH5_nd4vCaKEKw4WBqi2FtExbXZWqbFuQvLK6KzuJCmqwGiphhUEJwFkpazQGlBSqglqMye1Ba4KPMaBtNsENEL4bzpr965pq1hxel9mbA-sQ8Z87Ln8BBeVs5w</recordid><startdate>200006</startdate><enddate>200006</enddate><creator>Harrison, L.J.</creator><creator>Tayag, T.J.</creator><creator>Simonis, G.J.</creator><creator>Stead, M.</creator><creator>Euliss, G.W.</creator><creator>Leavitt, R.P.</creator><general>IEEE</general><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>200006</creationdate><title>Monolithic integration of 1.3-/spl mu/m Stark-ladder electroabsorption waveguide modulators with multimode-interference splitters</title><author>Harrison, L.J. ; Tayag, T.J. ; Simonis, G.J. ; Stead, M. ; Euliss, G.W. ; Leavitt, R.P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c935-c13ca6b234f09f96252bba416f9d2d4e5a7af9a63f3ce4aa10247ecca54356a73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Absorption</topic><topic>Etching</topic><topic>Integrated optics</topic><topic>Monolithic integrated circuits</topic><topic>Optical beams</topic><topic>Optical modulation</topic><topic>Optical waveguides</topic><topic>Photonic band gap</topic><topic>Propagation losses</topic><topic>Quantum well devices</topic><toplevel>online_resources</toplevel><creatorcontrib>Harrison, L.J.</creatorcontrib><creatorcontrib>Tayag, T.J.</creatorcontrib><creatorcontrib>Simonis, G.J.</creatorcontrib><creatorcontrib>Stead, M.</creatorcontrib><creatorcontrib>Euliss, G.W.</creatorcontrib><creatorcontrib>Leavitt, R.P.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><jtitle>IEEE photonics technology letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Harrison, L.J.</au><au>Tayag, T.J.</au><au>Simonis, G.J.</au><au>Stead, M.</au><au>Euliss, G.W.</au><au>Leavitt, R.P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Monolithic integration of 1.3-/spl mu/m Stark-ladder electroabsorption waveguide modulators with multimode-interference splitters</atitle><jtitle>IEEE photonics technology letters</jtitle><stitle>LPT</stitle><date>2000-06</date><risdate>2000</risdate><volume>12</volume><issue>6</issue><spage>657</spage><epage>659</epage><pages>657-659</pages><issn>1041-1135</issn><eissn>1941-0174</eissn><coden>IPTLEL</coden><abstract>In this letter, we describe a novel fabrication process for the monolithic integration of a waveguide power splitter based on the multimode-interference effect with multiple-quantum well (MQW) electroabsorption modulators based on the Stark-ladder effect. The integrated device is fabricated by a one-step epitaxy process using molecular-beam-epitaxy growth and three lithographic steps that eliminates the need for aligned regrowth of the MQW modulator. Experimental results of the modulation depth and wavelength dependence are also reported.</abstract><pub>IEEE</pub><doi>10.1109/68.849075</doi><tpages>3</tpages></addata></record> |
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subjects | Absorption Etching Integrated optics Monolithic integrated circuits Optical beams Optical modulation Optical waveguides Photonic band gap Propagation losses Quantum well devices |
title | Monolithic integration of 1.3-/spl mu/m Stark-ladder electroabsorption waveguide modulators with multimode-interference splitters |
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