A probabilistic approach to run-to-run control

This paper considers model uncertainty in the run-to-run control problem from a probabilistic viewpoint. The methodology assumes that the model parameters are stochastic and uses experimental input-output data off-line to characterize the probability distribution of the model parameters. This natura...

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Veröffentlicht in:IEEE transactions on semiconductor manufacturing 1998-11, Vol.11 (4), p.654-669
Hauptverfasser: Hamby, E.S., Kabamba, P.T., Khargonekar, P.P.
Format: Artikel
Sprache:eng
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Zusammenfassung:This paper considers model uncertainty in the run-to-run control problem from a probabilistic viewpoint. The methodology assumes that the model parameters are stochastic and uses experimental input-output data off-line to characterize the probability distribution of the model parameters. This naturally leads to the notions of probability of stability and probability of performance as a means of evaluating run-to-run controllers. Analytic formulas for the probability of stability are given for the particular case of an EWMA controller. When considering a more general notion of performance, the Monte Carlo method is used to approximate the probability of performance to a high degree of confidence. This probabilistic approach to run-to-run control is then illustrated on a virtual plasma etching reactor. Finally, the reliability of the method is investigated.
ISSN:0894-6507
1558-2345
DOI:10.1109/66.728563