A 14 ns 256 K1 CMOS SRAM with multiple test modes
A methodology to enter and exit from test modes in asynchronous static RAMs (SRAMs) is presented. This chip is fabricated in a 0.7 mu m twin-tub, single-poly, double-metal technology on p/p/sup +/ epitaxial substrate. To prevent hot-electron degradation, a voltage regulator is used in the memory mat...
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Veröffentlicht in: | IEEE journal of solid-state circuits 1989-08, Vol.24 (4), p.874-880 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A methodology to enter and exit from test modes in asynchronous static RAMs (SRAMs) is presented. This chip is fabricated in a 0.7 mu m twin-tub, single-poly, double-metal technology on p/p/sup +/ epitaxial substrate. To prevent hot-electron degradation, a voltage regulator is used in the memory matrix, with the cascoding technique applied in the periphery. Circuits were implemented against voltage bumps and data glitching on the output. A small cell size of 5.1*13.7 mu m/sup 2/ and a chip size of 3.9*9.5 mm/sup 2/ have been achieved.< > |
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ISSN: | 0018-9200 1558-173X |
DOI: | 10.1109/4.34064 |