Crystallization behavior of amorphous terfenol-D thin films

Crystallization behavior of amorphous terfenol-D thin films

The annealing behavior of amorphous terfenol-D thin films is examined in this work. Amorphous thin films were prepared by DC magnetron sputter deposition from alloy targets. Differential scanning calorimetry of these films was performed in the temperature range 100-800/spl deg/C. Based on DSC data a...

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Veröffentlicht in:IEEE transactions on magnetics 1997-09, Vol.33 (5), p.3937-3939
Hauptverfasser: Loveless, M., Guruswamy, S., Shield, J.E.
Format: Artikel
Sprache:eng
Schlagworte:
Amorphous magnetic materials
Amorphous materials
Annealing
Calorimetry
Crystallization
Iron
Sputtering
Temperature distribution
Transistors
X-ray diffraction
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Zusammenfassung:The annealing behavior of amorphous terfenol-D thin films is examined in this work. Amorphous thin films were prepared by DC magnetron sputter deposition from alloy targets. Differential scanning calorimetry of these films was performed in the temperature range 100-800/spl deg/C. Based on DSC data annealing experiments were performed at 400, 550, 575, 600 and 650/spl deg/C. X-ray diffraction shows RFe/sub 2/ phase is formed when samples are annealed at 575-600/spl deg/C. Other phases observed are Fe and rare earth oxide.
ISSN:0018-9464
1941-0069
DOI:10.1109/20.619621