Thick yttrium-iron-garnet (YIG) films produced by pulsed laser deposition (PLD) for integration applications

Thick yttrium-iron-garnet (YIG) films produced by pulsed laser deposition (PLD) for integration applications

High magnetic and dielectric quality, thick (50-100 /spl mu/m), epitaxial, yttrium-iron-garnet (YIG) films were deposited at high rate by PLD. A two-step (low temperature deposition followed by rapid thermal anneal) low thermal budget PLD process was demonstrated suitable to deposit thick polycrysta...

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Veröffentlicht in:IEEE transactions on magnetics 1995-11, Vol.31 (6), p.3832-3834
Hauptverfasser: Buhay, H., Adam, J.D., Daniel, M.R., Doyle, N.J., Driver, M.C., Eldridge, G.W., Hanes, M.H., Messham, R.L., Sopira, M.M.
Format: Artikel
Sprache:eng
Schlagworte:
Dielectrics
Magnetic films
Metallization
Optical pulses
Pulsed laser deposition
Rapid thermal annealing
Rapid thermal processing
Semiconductor films
Temperature
Yttrium
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Beschreibung
Zusammenfassung:High magnetic and dielectric quality, thick (50-100 /spl mu/m), epitaxial, yttrium-iron-garnet (YIG) films were deposited at high rate by PLD. A two-step (low temperature deposition followed by rapid thermal anneal) low thermal budget PLD process was demonstrated suitable to deposit thick polycrystalline YIG films on metallized Si and GaAs. A modified PLD apparatus is used to deposit uniform, 80-100 /spl mu/m, thick YIG films on 3-inch semiconductor wafers for integrated microwave circulator fabrication.
ISSN:0018-9464
1941-0069
DOI:10.1109/20.489787