Magnetic and magnetoelastic properties of amorphous Fe-Si-B-C films

Magnetic and magnetoelastic properties of amorphous Fe-Si-B-C films

We present magnetic and magnetoelastic data measured from a wide range of amorphous films grown by RF sputter deposition. The films were deposited in HV conditions at sputtering pressures of 5 to 80 mTorr and power densities of 1.6 and 3.2 W/cm/sup 2/. Compositions were measured by electron probe mi...

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Veröffentlicht in:IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) 1994-11, Vol.30 (6), p.4806-4808
Hauptverfasser: Mattingley, A.D., Shearwood, C., Gibbs, M.R.J.
Format: Artikel
Sprache:eng
Schlagworte:
360103 > Metals & Alloys-- Mechanical Properties
ALLOYS
Amorphous magnetic materials
Amorphous materials
AMORPHOUS STATE
BORON ALLOYS
CARBON ADDITIONS
COERCIVE FORCE
DATA
Electrons
EXPERIMENTAL DATA
INFORMATION
IRON ALLOYS
IRON BASE ALLOYS
Magnetic anisotropy
Magnetic films
MAGNETIC PROPERTIES
MATERIALS SCIENCE
MECHANICAL PROPERTIES
NUMERICAL DATA
Perpendicular magnetic anisotropy
PHYSICAL PROPERTIES
Radio frequency
RESIDUAL STRESSES
SILICON ALLOYS
Sputtering
STRESSES 360104 > Metals & Alloys-- Physical Properties
TENSILE PROPERTIES
Tensile stress
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Beschreibung
Zusammenfassung:We present magnetic and magnetoelastic data measured from a wide range of amorphous films grown by RF sputter deposition. The films were deposited in HV conditions at sputtering pressures of 5 to 80 mTorr and power densities of 1.6 and 3.2 W/cm/sup 2/. Compositions were measured by electron probe micro-analysis (EPMA) and found to be similar to the target material at pressures of 20 mTorr. This pressure also gave the minimum coercivity and minimum stress corresponding to a transition from compressive to tensile stress. All films exhibited in-plane anisotropy, the origin of which is the stray induction from the target magnetron magnets.< >
ISSN:0018-9464
1941-0069
DOI:10.1109/20.334228