Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording
The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were...
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| Veröffentlicht in: | IEEE transactions on magnetics 1990-09, Vol.26 (5), p.2277-2279 |
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| container_end_page | 2279 |
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| container_title | IEEE transactions on magnetics |
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| creator | Mahvan, N. Zeltser, A.M. Lambeth, D.N. Laughlin, D.E. Kryder, M.H. |
| description | The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were utilized to determine the correlation between the observed coercivity, remanence squareness behavior, and microstructure. It has been found that in the case of films on NiP/Al substrates, the coercivity is controlled by the grain size, whereas it is dominated by the relative amount of the HCP and FCC cobalt phases for the films deposited on a 300-nm Cr underlayer. An increase in the Ar pressure leads to a further increase in coercivity for both substrates. This behavior was attributed to an increase in the grain size and a more favorable c-axis orientation of the HCP cobalt phase for Cr and NiP underlayers, respectively.< > |
| doi_str_mv | 10.1109/20.104696 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_crossref_primary_10_1109_20_104696</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>104696</ieee_id><sourcerecordid>28760597</sourcerecordid><originalsourceid>FETCH-LOGICAL-c404t-71cfb7b9a52d3eaa35d840d49e02fe8c651706c3d6178cfb97cb880372959a443</originalsourceid><addsrcrecordid>eNqNkDtPBCEURonRxHW1sLWi0cQChYHhUZqNr8RXobGcsAysmJlhBabw38s-Ei2tPm5yOPfmA-CY4AtCsLqsSmLGFd8BE6IYQRhztQsmGBOJFONsHxyk9FlGVhM8Ae-P3sSQchxNHqOFemhhrxeDzd7AZQxLG7O3CQYH84cfkPNdD2cBPXn0kqELEXZhWPg8tn7QHYzWhFiei0Ow53SX7NE2p-Dt5vp1docenm_vZ1cPyDDMMhLEuLmYK11XLbVa07qVDLdMWVw5Kw2vicDc0JYTIQuqhJlLiamoVK00Y3QKzjbecuvXaFNuep-M7To92DCmppKC41qJf4C07KKqgOcbcNVLitY1y-h7Hb8bgptVx01Vct1xYU-3Up2M7lzUg_Hp94OidUXlynmy4by19o9vLfkB1vODgw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28351739</pqid></control><display><type>article</type><title>Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording</title><source>IEEE Electronic Library (IEL)</source><creator>Mahvan, N. ; Zeltser, A.M. ; Lambeth, D.N. ; Laughlin, D.E. ; Kryder, M.H.</creator><creatorcontrib>Mahvan, N. ; Zeltser, A.M. ; Lambeth, D.N. ; Laughlin, D.E. ; Kryder, M.H.</creatorcontrib><description>The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were utilized to determine the correlation between the observed coercivity, remanence squareness behavior, and microstructure. It has been found that in the case of films on NiP/Al substrates, the coercivity is controlled by the grain size, whereas it is dominated by the relative amount of the HCP and FCC cobalt phases for the films deposited on a 300-nm Cr underlayer. An increase in the Ar pressure leads to a further increase in coercivity for both substrates. This behavior was attributed to an increase in the grain size and a more favorable c-axis orientation of the HCP cobalt phase for Cr and NiP underlayers, respectively.< ></description><identifier>ISSN: 0018-9464</identifier><identifier>EISSN: 1941-0069</identifier><identifier>DOI: 10.1109/20.104696</identifier><identifier>CODEN: IEMGAQ</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Argon ; Chromium ; Coercive force ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Electrons ; Exact sciences and technology ; Grain size ; Magnetic films ; Magnetic properties ; Magnetic properties and materials ; Metals. Metallurgy ; Microstructure ; Physics ; Sputtering ; Substrates</subject><ispartof>IEEE transactions on magnetics, 1990-09, Vol.26 (5), p.2277-2279</ispartof><rights>1991 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c404t-71cfb7b9a52d3eaa35d840d49e02fe8c651706c3d6178cfb97cb880372959a443</citedby><cites>FETCH-LOGICAL-c404t-71cfb7b9a52d3eaa35d840d49e02fe8c651706c3d6178cfb97cb880372959a443</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/104696$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,792,23909,23910,25118,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/104696$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19352389$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Mahvan, N.</creatorcontrib><creatorcontrib>Zeltser, A.M.</creatorcontrib><creatorcontrib>Lambeth, D.N.</creatorcontrib><creatorcontrib>Laughlin, D.E.</creatorcontrib><creatorcontrib>Kryder, M.H.</creatorcontrib><title>Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording</title><title>IEEE transactions on magnetics</title><addtitle>TMAG</addtitle><description>The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were utilized to determine the correlation between the observed coercivity, remanence squareness behavior, and microstructure. It has been found that in the case of films on NiP/Al substrates, the coercivity is controlled by the grain size, whereas it is dominated by the relative amount of the HCP and FCC cobalt phases for the films deposited on a 300-nm Cr underlayer. An increase in the Ar pressure leads to a further increase in coercivity for both substrates. This behavior was attributed to an increase in the grain size and a more favorable c-axis orientation of the HCP cobalt phase for Cr and NiP underlayers, respectively.< ></description><subject>Applied sciences</subject><subject>Argon</subject><subject>Chromium</subject><subject>Coercive force</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Electrons</subject><subject>Exact sciences and technology</subject><subject>Grain size</subject><subject>Magnetic films</subject><subject>Magnetic properties</subject><subject>Magnetic properties and materials</subject><subject>Metals. Metallurgy</subject><subject>Microstructure</subject><subject>Physics</subject><subject>Sputtering</subject><subject>Substrates</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNqNkDtPBCEURonRxHW1sLWi0cQChYHhUZqNr8RXobGcsAysmJlhBabw38s-Ei2tPm5yOPfmA-CY4AtCsLqsSmLGFd8BE6IYQRhztQsmGBOJFONsHxyk9FlGVhM8Ae-P3sSQchxNHqOFemhhrxeDzd7AZQxLG7O3CQYH84cfkPNdD2cBPXn0kqELEXZhWPg8tn7QHYzWhFiei0Ow53SX7NE2p-Dt5vp1docenm_vZ1cPyDDMMhLEuLmYK11XLbVa07qVDLdMWVw5Kw2vicDc0JYTIQuqhJlLiamoVK00Y3QKzjbecuvXaFNuep-M7To92DCmppKC41qJf4C07KKqgOcbcNVLitY1y-h7Hb8bgptVx01Vct1xYU-3Up2M7lzUg_Hp94OidUXlynmy4by19o9vLfkB1vODgw</recordid><startdate>19900901</startdate><enddate>19900901</enddate><creator>Mahvan, N.</creator><creator>Zeltser, A.M.</creator><creator>Lambeth, D.N.</creator><creator>Laughlin, D.E.</creator><creator>Kryder, M.H.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>7QF</scope><scope>8BQ</scope><scope>JG9</scope></search><sort><creationdate>19900901</creationdate><title>Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording</title><author>Mahvan, N. ; Zeltser, A.M. ; Lambeth, D.N. ; Laughlin, D.E. ; Kryder, M.H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c404t-71cfb7b9a52d3eaa35d840d49e02fe8c651706c3d6178cfb97cb880372959a443</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>Applied sciences</topic><topic>Argon</topic><topic>Chromium</topic><topic>Coercive force</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Electrons</topic><topic>Exact sciences and technology</topic><topic>Grain size</topic><topic>Magnetic films</topic><topic>Magnetic properties</topic><topic>Magnetic properties and materials</topic><topic>Metals. Metallurgy</topic><topic>Microstructure</topic><topic>Physics</topic><topic>Sputtering</topic><topic>Substrates</topic><toplevel>online_resources</toplevel><creatorcontrib>Mahvan, N.</creatorcontrib><creatorcontrib>Zeltser, A.M.</creatorcontrib><creatorcontrib>Lambeth, D.N.</creatorcontrib><creatorcontrib>Laughlin, D.E.</creatorcontrib><creatorcontrib>Kryder, M.H.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Aluminium Industry Abstracts</collection><collection>METADEX</collection><collection>Materials Research Database</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Mahvan, N.</au><au>Zeltser, A.M.</au><au>Lambeth, D.N.</au><au>Laughlin, D.E.</au><au>Kryder, M.H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>1990-09-01</date><risdate>1990</risdate><volume>26</volume><issue>5</issue><spage>2277</spage><epage>2279</epage><pages>2277-2279</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were utilized to determine the correlation between the observed coercivity, remanence squareness behavior, and microstructure. It has been found that in the case of films on NiP/Al substrates, the coercivity is controlled by the grain size, whereas it is dominated by the relative amount of the HCP and FCC cobalt phases for the films deposited on a 300-nm Cr underlayer. An increase in the Ar pressure leads to a further increase in coercivity for both substrates. This behavior was attributed to an increase in the grain size and a more favorable c-axis orientation of the HCP cobalt phase for Cr and NiP underlayers, respectively.< ></abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/20.104696</doi><tpages>3</tpages></addata></record> |
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| ispartof | IEEE transactions on magnetics, 1990-09, Vol.26 (5), p.2277-2279 |
| issn | 0018-9464 1941-0069 |
| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | Applied sciences Argon Chromium Coercive force Condensed matter: electronic structure, electrical, magnetic, and optical properties Electrons Exact sciences and technology Grain size Magnetic films Magnetic properties Magnetic properties and materials Metals. Metallurgy Microstructure Physics Sputtering Substrates |
| title | Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T03%3A21%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Microstructure%20and%20magnetic%20properties%20of%20thin-film%20Co-Ni-Pt%20for%20longitudinal%20recording&rft.jtitle=IEEE%20transactions%20on%20magnetics&rft.au=Mahvan,%20N.&rft.date=1990-09-01&rft.volume=26&rft.issue=5&rft.spage=2277&rft.epage=2279&rft.pages=2277-2279&rft.issn=0018-9464&rft.eissn=1941-0069&rft.coden=IEMGAQ&rft_id=info:doi/10.1109/20.104696&rft_dat=%3Cproquest_RIE%3E28760597%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28351739&rft_id=info:pmid/&rft_ieee_id=104696&rfr_iscdi=true |