Microstructure and magnetic properties of thin-film Co-Ni-Pt for longitudinal recording

The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were...

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Veröffentlicht in:IEEE transactions on magnetics 1990-09, Vol.26 (5), p.2277-2279
Hauptverfasser: Mahvan, N., Zeltser, A.M., Lambeth, D.N., Laughlin, D.E., Kryder, M.H.
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Sprache:eng
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Zusammenfassung:The dependence of microstructure and magnetic properties of RF-sputtered thin films of Co-Ni-Pt deposited on NiP/Al and Cr/NiP/Al substrates was studied as a function of platinum composition, Ar pressure, and sputtering power. Transmission electron microscopy and electron and X-ray diffraction were utilized to determine the correlation between the observed coercivity, remanence squareness behavior, and microstructure. It has been found that in the case of films on NiP/Al substrates, the coercivity is controlled by the grain size, whereas it is dominated by the relative amount of the HCP and FCC cobalt phases for the films deposited on a 300-nm Cr underlayer. An increase in the Ar pressure leads to a further increase in coercivity for both substrates. This behavior was attributed to an increase in the grain size and a more favorable c-axis orientation of the HCP cobalt phase for Cr and NiP underlayers, respectively.< >
ISSN:0018-9464
1941-0069
DOI:10.1109/20.104696