Direct inversion of interfacial reflectivity data using the Patterson function

It is shown here that the interfacial profile between two bonded wafers can be directly determined using X‐ray reflectivity without resorting to standard model‐fitting of the data. The phase problem inherent to any structure determination by scattering technique is solved in this case using a known...

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Veröffentlicht in:Journal of applied crystallography 2003-12, Vol.36 (6), p.1352-1355
Hauptverfasser: Bataillou, Benoît, Moriceau, Hubert, Rieutord, François
Format: Artikel
Sprache:eng
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Zusammenfassung:It is shown here that the interfacial profile between two bonded wafers can be directly determined using X‐ray reflectivity without resorting to standard model‐fitting of the data. The phase problem inherent to any structure determination by scattering technique is solved in this case using a known silicon/silicon oxide interface, which acts as a phase reference for the reflected signals.
ISSN:1600-5767
0021-8898
1600-5767
DOI:10.1107/S0021889803016649