Quantifying the U 5 f covalence and degree of localization in U intermetallics

A procedure for quantifying the U 5 f electronic covalency and degree of localization in U intermetallic compounds is presented. To this end, bulk sensitive hard and soft x-ray photoelectron spectroscopy were utilized in combination with density-functional theory (DFT) plus dynamical mean-field theo...

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Veröffentlicht in:Physical review research 2024-07, Vol.6 (3), Article 033068
Hauptverfasser: Marino, Andrea, Christovam, Denise S., Takegami, Daisuke, Falke, Johannes, Carvalho, Miguel M. F., Okauchi, Takaki, Chang, Chun-Fu, Altendorf, Simone G., Amorese, Andrea, Sundermann, Martin, Gloskovskii, Andrei, Gretarsson, Hlynur, Keimer, Bernhard, Andreev, Alexandr V., Havela, Ladislav, Leithe-Jasper, Andreas, Severing, Andrea, Kuneš, Jan, Tjeng, Liu Hao, Hariki, Atsushi
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Sprache:eng
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Zusammenfassung:A procedure for quantifying the U 5 f electronic covalency and degree of localization in U intermetallic compounds is presented. To this end, bulk sensitive hard and soft x-ray photoelectron spectroscopy were utilized in combination with density-functional theory (DFT) plus dynamical mean-field theory (DMFT) calculations. The energy dependence of the photoionization cross sections allows the disentanglement of the U  5 f contribution to the valence band from the various other atomic subshells so the computational parameters in the DFT + DMFT can be reliably determined. Applying this method to UGa 2 and UB 2 as model compounds from opposite ends of the (de)localization range, we have achieved excellent simulations of the valence band and core-level spectra. The width in the distribution of atomic U  5 f configurations contributing to the ground state, as obtained from the calculations, quantifies the correlated nature and degree of localization of the U  5 f . The findings permit answering the longstanding question why different spectroscopic techniques give seemingly different numbers for the U 5 f valence in intermetallic U compounds.
ISSN:2643-1564
2643-1564
DOI:10.1103/PhysRevResearch.6.033068