Avalanche ionization and dielectric breakdown in silicon with ultrafast laser pulses

Experimental evidence is presented demonstrating avalanche ionization as the dominant mechanism for dielectric breakdown in silicon with ultrafast laser pulses at above-gap photon energies. Data are presented for pulses between 80 fs and 9 ns at 786 nm and 1.06 {mu}m. Associated electric fields rang...

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Veröffentlicht in:Physical Review, B: Condensed Matter B: Condensed Matter, 1998-08, Vol.58 (5), p.2387-2390
Hauptverfasser: Pronko, P. P., VanRompay, P. A., Horvath, C., Loesel, F., Juhasz, T., Liu, X., Mourou, G.
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Sprache:eng
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Zusammenfassung:Experimental evidence is presented demonstrating avalanche ionization as the dominant mechanism for dielectric breakdown in silicon with ultrafast laser pulses at above-gap photon energies. Data are presented for pulses between 80 fs and 9 ns at 786 nm and 1.06 {mu}m. Associated electric fields range from 0.3 to 40 MV/cm. Avalanche ionization coefficients range from 10{sup 10} to 10{sup 14} s{sup {minus}1} and are discussed in relation to semiempirical dc ionization theory and recent ac Monte Carlo calculations. Correlation is obtained between electron collision times and associated ionization rates. thinsp {copyright} {ital 1998} {ital The American Physical Society}
ISSN:0163-1829
1095-3795
DOI:10.1103/PhysRevB.58.2387