Relationship between orbital moment anisotropy, magnetocrystalline anisotropy, and Dzyaloshinskii-Moriya interaction in W/Co/Pt trilayers
We have studied the Co layer thickness dependences of magnetocrystalline anisotropy (MCA), Dzyaloshinskii-Moriya interaction (DMI), and orbital moment anisotropy (OMA) in W/Co/Pt trilayers, in order to clarify their correlations with each other. We find that the MCA favors magnetization along the fi...
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Veröffentlicht in: | Physical review. B 2024-11, Vol.110 (18), Article 184401 |
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Hauptverfasser: | , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We have studied the Co layer thickness dependences of magnetocrystalline anisotropy (MCA), Dzyaloshinskii-Moriya interaction (DMI), and orbital moment anisotropy (OMA) in W/Co/Pt trilayers, in order to clarify their correlations with each other. We find that the MCA favors magnetization along the film normal and monotonically increases with decreasing effective magnetic layer thickness (
t
eff
). The magnitude of the Dzyaloshinskii-Moriya exchange constant (
|
D
|
) increases with decreasing
t
eff
until
t
eff
∼
1
nm, below which
|
D
|
decreases. The MCA and
|
D
|
scale with
1
/
t
eff
for
t
eff
larger than
∼
1
nm, indicating an interfacial origin. The increase of MCA with decreasing
t
eff
continues below
t
eff
∼
1 nm, but with a slower rate. To clarify the cause of the
t
eff
dependences of MCA and DMI, the OMA of Co in W/Co/Pt trilayers is studied using x-ray magnetic circular dichroism. We find nonzero OMA when
t
eff
is smaller than
∼
0.8
nm. The OMA increases with decreasing
t
eff
more rapidly than what is expected from the MCA, indicating that factors other than OMA contribute to the MCA at small
t
eff
. The
t
eff
dependence of the OMA also suggests that
|
D
|
at
t
eff
smaller than
∼
1
nm is not related to the OMA at the interface. We propose that the growth of Co on W results in a strain and/or texture that reduces the interfacial DMI, and, to some extent, MCA at small
t
eff
. |
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ISSN: | 2469-9950 2469-9969 |
DOI: | 10.1103/PhysRevB.110.184401 |