Localization of Silicon in Specific Cell Wall Layers of the Stomatal Apparatus of Sugar Cane by Use of Energy Dispersive X-ray Analysis

By use of combined light, transmission electron, and scanning electron microscopy with energy dispersive analysis of X-rays, silicon was localized in specific cell wall layers of the stomatal apparatus of sugar cane. The silicon occurs beneath the cuticle in layers of wall which correspond to the middle lamella and first-formed primary wall region of interior plant cells. In other plants these regions are also reported high in pectins and hemicellulose. It is suggested that the silicon may interact with the pectins and hemicellulose and also with the lignins and phenolics which may also be deposited in these wall layers.