Polarization dependent multiphoton absorption in ZnO thin films

We present a simple non-destructive approach for studying the polarization dependence of nonlinear absorption processes in semiconductors. The method is based on measuring the yield of the near UV photoluminescence as a function of polarization and intensity of femtosecond laser pulses. In particula...

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Veröffentlicht in:Journal of physics. D, Applied physics Applied physics, 2020-01, Vol.53 (5), p.55102
Hauptverfasser: Hollinger, Richard, Gupta, Dishiti, Zapf, Maximilian, Karst, Maximilian, Röder, Robert, Uschmann, Ingo, Reislöhner, Udo, Kartashov, Daniil, Ronning, Carsten, Spielmann, Christian
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Sprache:eng
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Zusammenfassung:We present a simple non-destructive approach for studying the polarization dependence of nonlinear absorption processes in semiconductors. The method is based on measuring the yield of the near UV photoluminescence as a function of polarization and intensity of femtosecond laser pulses. In particular, we investigated the polarization dependence of three photon laser absorption in intrinsic and Al-doped ZnO thin films. Both specimen show stronger emission for linearly polarized excitation compared to circular polarization. The ratios for the three-photon absorption coefficients are about 1.8 and independent of the doping. It is shown that Al-doped films have lower threshold for stimulated emission in comparison to the intrinsic films.
ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/ab5372