Pattern size tolerance of reverse offset printing: a proximity deformation effect related to local PDMS slipping

We investigated the shape integrity of silver nanoparticle ink patterns formed by reverse offset printing, focusing particularly on the proximity effect of neighbouring patterns due to the local deformation of a polydimethylsiloxane (PDMS) blanket during contact with a hard cliché. We performed printing tests using a cliché having circular patterns with smaller neighbouring circles located at various distances (2-20 µm), and the results revealed that as we decrease the thickness of PDMS and the inter-pattern gap distance, and as we increase the printing indentations, the shape integrity of the printed pattern was worsened. A complementary numerical simulation of PDMS deformations suggested that the pattern distortion during the contact with clichés was caused by the horizontal deformation of PDMS during the printing, which becomes a significant burden when the uplifted region of PDMS is closer to the gap distance of each pattern. Our analysis further indicates that during printing, there is slipping of the ink at the PDMS interface. In addition, we examined the effects of a synchronization mismatch in a roll-to-sheet printing on the pattern size tolerance. The magnitude of the size distortions was severely influenced not only by the mismatch ratio but also by the nip width. This result verifies the scraping of the ink accompanied by the slipping of the PDMS during the printing process, and thereby determines the size tolerance of printed patterns in reverse offset printing. Finally, we discuss the optimization of process parameters to ensure the size integrity of reverse offset printing.