Irradiation effects in Fe-30%Ni thin film during Ar ion implantation

The effect of irradiation with low energy argon ions (40 KeV, and fluences of 10 15 to 10 17 ions/cm 2 ) on deposited thin films of Fe-30% Ni alloy was investigated using RBS and TEM techniques. The thickness of these films is about 65 ∓ 10 nm deposited on ceramic, KBr, and Be foils substrates. Gas...

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Veröffentlicht in:	Radiation effects and defects in solids 1994-12, Vol.132 (4), p.329-338
Hauptverfasser:	Soukieh, M., Al-Mohamad, A.
Format:	Artikel
Sprache:	eng
Schlagworte:	40 KeV Ar implantation Applied sciences Ar depth profile Condensed matter: structure, mechanical and thermal properties Defects and impurities in crystals microstructure Doping and impurity implantation in other materials Exact sciences and technology Fe-30 Ni-70 gas bubble formation Metals. Metallurgy ordered phases of Fe Physics Structure of solids and liquids crystallography thin film
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Zusammenfassung:	The effect of irradiation with low energy argon ions (40 KeV, and fluences of 10 15 to 10 17 ions/cm 2 ) on deposited thin films of Fe-30% Ni alloy was investigated using RBS and TEM techniques. The thickness of these films is about 65 ∓ 10 nm deposited on ceramic, KBr, and Be foils substrates. Gas bubble formation and profile distribution of the implanted argon ions were investigated. Formation of an ordered phase of Fe 3 Ni during irradiation appears to inhibit gas bubble formation.
ISSN:	1042-0150 1029-4953
DOI:	10.1080/10420159408219985