TfP210. Thin-film ZnO ultrasonic transducer arrays for operation at 100 MHz

Thin-film ZnO ultrasonic transducer arrays for operation at 100 MHz were developed and evaluated. Epitaxial, high acoustic quality ZnO film layers of 10 μm thickness could be produced by sputter deposition on well (111)-oriented gold films with chromium sublayers evaporated on (0001) sapphire. Using...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Ferroelectrics 1992-09, Vol.134 (1), p.325-330
Hauptverfasser: Ito, Yukio, Kushida, Keiko, Kanda, Hiroshi, Takeuchi, Hiroshi, Sugawara, Kazuhiro, Onozato, Harumasa
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Thin-film ZnO ultrasonic transducer arrays for operation at 100 MHz were developed and evaluated. Epitaxial, high acoustic quality ZnO film layers of 10 μm thickness could be produced by sputter deposition on well (111)-oriented gold films with chromium sublayers evaporated on (0001) sapphire. Using a photoresist etching mask of the desired pattern, the upper Au/Cr electrode and subsequent ZnO film were etched to form grooves separating the multi-layered film into array elements with a 100 μm pitch. It was found that the ultrasound beam in the azimuth plane for a 32-element array could be electronically focused in the 100 MHz range to obtain a half-amplitude width of 60 μm at the focal depth in water. This value reasonably agrees with the theoretically calculated value.
ISSN:0015-0193
1563-5112
DOI:10.1080/00150199208015607