Coating Thickness Determination by Cathodic Sputtering Glow Discharge Atomic Absorption Spectrometry (GDAAS)

A method of coating thickness determination using cathodic sputtering glow discharge as atomizer with atomic absorption spectrometry (GDAAS) is developed. By the relationship of absorbance A and the specific quantity of sputtering qc, Cu, Ni-P and Zn coating thickness determinations have been tested...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Analytical letters 1993-03, Vol.26 (3), p.541-556
Hauptverfasser: Jinglin, You, Zhenshu, Wang, Gongshu, Zhang, Jianshi, Ren
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A method of coating thickness determination using cathodic sputtering glow discharge as atomizer with atomic absorption spectrometry (GDAAS) is developed. By the relationship of absorbance A and the specific quantity of sputtering qc, Cu, Ni-P and Zn coating thickness determinations have been tested. Experiments show that if the relationship between A and qc has been established, no properly prepared standards are usually necessary. It is a generally suitable method for conducting samples. Precision > 2.6% and no systematic error has been found.
ISSN:0003-2719
1532-236X
DOI:10.1080/00032719308016817