High-power EUV (13.5 nm) light source

Characteristics of a discharge-produced plasma (DPP) light source in the spectral band 13.5{+-}0.135 nm, developed for Extreme Ultra Violet (EUV) lithography, are presented. EUV light is generated by DPP in tin vapour formed between rotating disk electrodes. The discharge is ignited by a focused las...

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Veröffentlicht in:	Quantum electronics (Woodbury, N.Y.) N.Y.), 2010-10, Vol.40 (8), p.720-726
Hauptverfasser:	Borisov, Vladimir M, Borisova, Galina N, Vinokhodov, Aleksandr Yu, Zakharov, S V, Ivanov, Aleksandr S, Kiryukhin, Yurii B, Mishchenko, Valentin A, Prokof'ev, Aleksandr V, Khristoforov, Oleg B
Format:	Artikel
Sprache:	eng
Schlagworte:	70 PLASMA PHYSICS AND FUSION TECHNOLOGY BEAMS CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS COMPUTERIZED SIMULATION DATA ELECTRIC DISCHARGES ELECTRODES ELECTROMAGNETIC RADIATION ELEMENTS EXPERIMENTAL DATA EXTREME ULTRAVIOLET RADIATION FLUIDS FREQUENCY RANGE GASES INFORMATION KHZ RANGE LASER RADIATION LIGHT SOURCES METALS NUMERICAL DATA PHOTON BEAMS PLASMA PULSES RADIATION SOURCES RADIATIONS SIMULATION TIN ULTRAVIOLET RADIATION VAPORS
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