A capillary discharge plasma source of intense VUV radiation

A capillary discharge plasma source of intense VUV radiation

The results of investigation of a capillary discharge plasma, used as a source of intense VUV radiation and soft X-rays, are presented. The plasma was generated during the discharge of low-inductance condensers in a gas-filled ceramic capillary. Intense line radiation was observed in a broad spectra...

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Veröffentlicht in:Quantum electronics (Woodbury, N.Y.) N.Y.), 2003-01, Vol.33 (1), p.3-6
Hauptverfasser: Sobel'man, Igor I, Shevelko, A P, Yakushev, O F, Knight, L V, Turley, R S
Format: Artikel
Sprache:eng
Schlagworte:
ARGON
CARBON COMPOUNDS
CARBON DIOXIDE
CARBON OXIDES
CHALCOGENIDES
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
ELECTRIC DISCHARGES
ELECTRICAL PROPERTIES
ELECTROMAGNETIC RADIATION
ELEMENTS
FAR ULTRAVIOLET RADIATION
FLUIDS
GASES
INDUCTANCE
IONIZING RADIATIONS
KRYPTON
LINE WIDTHS
MICROSCOPY
NEON
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PLASMA
RADIATION SOURCES
RADIATIONS
RARE GASES
SOFT X RADIATION
ULTRAVIOLET RADIATION
X RADIATION
XENON
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Zusammenfassung:The results of investigation of a capillary discharge plasma, used as a source of intense VUV radiation and soft X-rays, are presented. The plasma was generated during the discharge of low-inductance condensers in a gas-filled ceramic capillary. Intense line radiation was observed in a broad spectral range (30-400 A) in various gases (CO{sub 2}, Ne, Ar, Kr, Xe). The absolute radiation yield for the xenon discharge was {approx}5 mJ (2{pi} sr){sup -1} pulse{sup -1} within a spectral band of width 9 A at 135 A. Such a radiation source can be used for various practical applications, such as EUV projection lithography, microscopy of biological objects in a 'water window', reflectometry, etc. (special issue devoted to the 80th anniversary of academician n g basov's birth)
ISSN:1063-7818
1468-4799
DOI:10.1070/QE2003v033n01ABEH002357