Adsorption-controlled growth of homoepitaxial c-plane sapphire films

Sapphire is a technologically highly relevant material, but it poses many challenges when performing epitaxial thin-film deposition. We have identified and applied the conditions for adsorption-controlled homoepitaxial growth of c-plane sapphire. The films thus grown are atomically smooth, have a co...

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Veröffentlicht in:APL materials 2024-09, Vol.12 (9), p.091112-091112-11
Hauptverfasser: Majer, Lena N., Acartürk, Tolga, van Aken, Peter A., Braun, Wolfgang, Camuti, Luca, Eckl-Haese, Johan, Mannhart, Jochen, Onuma, Takeyoshi, Rabinovich, Ksenia S., Schlom, Darrell G., Smink, Sander, Starke, Ulrich, Steele, Jacob, Vogt, Patrick, Wang, Hongguang, Hensling, Felix V. E.
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Sprache:eng
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Zusammenfassung:Sapphire is a technologically highly relevant material, but it poses many challenges when performing epitaxial thin-film deposition. We have identified and applied the conditions for adsorption-controlled homoepitaxial growth of c-plane sapphire. The films thus grown are atomically smooth, have a controlled termination, and are of outstanding crystallinity. Their chemical purity exceeds that of the substrates. The films exhibit exceptional optical properties, such as a single-crystal-like bandgap and a low density of F+ centers.
ISSN:2166-532X
2166-532X
DOI:10.1063/5.0224092