Modeling of a vertical tunneling transistor based on Gr-hBN- χ 3 borophene heterostructure
We present a computational study on the electrical behavior of the field-effect transistor based on vertical graphene-hBN-χ3 borophene heterostructure and vertical graphene nanoribbon-hBN-χ3 borophene nanoribbon heterostructure. We use nonequilibrium the Green function formalism along with an atomis...
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Veröffentlicht in: | Journal of applied physics 2022-07, Vol.132 (3) |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | We present a computational study on the electrical behavior of the field-effect transistor based on vertical graphene-hBN-χ3 borophene heterostructure and vertical graphene nanoribbon-hBN-χ3 borophene nanoribbon heterostructure. We use nonequilibrium the Green function formalism along with an atomistic tight-binding (TB) model. The TB parameters are calculated by fitting tight-binding band structure and first-principle results. Also, electrical characteristics of the device, such as ION/IOFF ratio, subthreshold swing, and intrinsic gate-delay time, are investigated. We show that the increase of the hBN layer number decreases subthreshold swing and degrades the intrinsic gate-delay time. The device allows current modulation 177 at room temperature for a 1.2 V gate-source bias voltage. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/5.0092647 |