Modeling of a vertical tunneling transistor based on Gr-hBN- χ 3 borophene heterostructure

We present a computational study on the electrical behavior of the field-effect transistor based on vertical graphene-hBN-χ3 borophene heterostructure and vertical graphene nanoribbon-hBN-χ3 borophene nanoribbon heterostructure. We use nonequilibrium the Green function formalism along with an atomis...

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Veröffentlicht in:Journal of applied physics 2022-07, Vol.132 (3)
Hauptverfasser: Abbasi, Reza, Faez, Rahim, Horri, Ashkan, Moravvej-Farshi, Mohammad Kazem
Format: Artikel
Sprache:eng
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Zusammenfassung:We present a computational study on the electrical behavior of the field-effect transistor based on vertical graphene-hBN-χ3 borophene heterostructure and vertical graphene nanoribbon-hBN-χ3 borophene nanoribbon heterostructure. We use nonequilibrium the Green function formalism along with an atomistic tight-binding (TB) model. The TB parameters are calculated by fitting tight-binding band structure and first-principle results. Also, electrical characteristics of the device, such as ION/IOFF ratio, subthreshold swing, and intrinsic gate-delay time, are investigated. We show that the increase of the hBN layer number decreases subthreshold swing and degrades the intrinsic gate-delay time. The device allows current modulation 177 at room temperature for a 1.2 V gate-source bias voltage.
ISSN:0021-8979
1089-7550
DOI:10.1063/5.0092647