A highly sensitive, large area, and self-powered UV photodetector based on coalesced gallium nitride nanorods/graphene/silicon (111) heterostructure
In this paper, we demonstrate an ultraviolet photodetector (UV-PD) that uses coalesced gallium nitride (GaN) nanorods (NRs) on a graphene/Si (111) substrate grown by plasma-assisted molecular beam epitaxy. We report a highly sensitive, self-powered, and hybrid GaN NR/graphene/Si (111) PD with a rela...
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Veröffentlicht in: | Applied physics letters 2020-11, Vol.117 (19) |
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Sprache: | eng |
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Zusammenfassung: | In this paper, we demonstrate an ultraviolet photodetector (UV-PD) that uses coalesced gallium nitride (GaN) nanorods (NRs) on a graphene/Si (111) substrate grown by plasma-assisted molecular beam epitaxy. We report a highly sensitive, self-powered, and hybrid GaN NR/graphene/Si (111) PD with a relatively large 100 mm2 active area, a high responsivity of 17.4 A/W, a high specific detectivity of 1.23 × 1013 Jones, and fast response speeds of 13.2/13.7 μs (20 kHz) under a UV light of 355 nm at zero bias voltage. The results show that the thin graphene acts as a perfect interface for GaN NRs, encouraging growth with minimum defects on the Si substrate. Our results suggest that the GaN NR/graphene/Si (111) heterojunction has a range of interesting properties that make it well-suited for a variety of photodetection applications. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/5.0018076 |