Plasmonic nitridation of SiO2/Si(100) surface covered with gold nanoparticles via nitrogen plasma-produced radicals and light

Plasmonic nitridation of SiO2/Si(100) surface covered with gold nanoparticles via nitrogen plasma-produced radicals and light

In this work, the optical response of gold nanoparticles was used for radical-induced nitridation of a SiO2/Si(100) surface. High-quality SiON thin films were successfully formed via radicals and light from a low-temperature, low-pressure nitrogen inductively coupled plasma at low substrate temperat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 2020-06, Vol.127 (24)
Hauptverfasser: Kitajima, Takeshi, Miyake, Machiko, Honda, Kohei, Nakano, Toshiki
Format: Artikel
Sprache:eng
Schlagworte:
Applied physics
Diameters
Gold
Hot electrons
Inductively coupled plasma
Leakage current
Low pressure
Low temperature
Nanoparticles
Nitrogen
Nitrogen plasma
Photoelectric emission
Radicals
Silicon dioxide
Silicon oxynitride
Substrates
Thickness
Thin films
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In this work, the optical response of gold nanoparticles was used for radical-induced nitridation of a SiO2/Si(100) surface. High-quality SiON thin films were successfully formed via radicals and light from a low-temperature, low-pressure nitrogen inductively coupled plasma at low substrate temperatures
ISSN:0021-8979
1089-7550
DOI:10.1063/5.0006841