Time-of-flight study on the thermal etching of Al with Cl2

A pseudorandom cross-correlation technique has been used to study the thermal etching of aluminum with molecular chlorine. Time-of-flight (TOF) distributions of particles desorbing from the substrate are measured by modulating the ejected product beam. Modulation is achieved by a rotating chopping d...

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Veröffentlicht in:	Applied physics letters 1988-01, Vol.52 (2), p.98-100
Hauptverfasser:	JANSSEN, R. J. A. A, KOLFSCHOTEN, A. W, VAN VEEN, G. N. A
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metals, semimetals and alloys Metals. Metallurgy Other surface treatments Physics Production techniques Specific materials Surface treatment
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