Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate

Samples of polymethylmethacrylate have been irradiated with laser pulses of 266 nm wavelength along with the wavelengths generated via hydrogen-shifted stimulated Raman scattering. A quadrupole mass spectrometer monitors in real time the photoablation products produced during the irradiation. At wav...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Appl. Phys. Lett.; (United States) 1986-11, Vol.49 (18), p.1175-1177
Hauptverfasser: ESTLER, R. C, NOGAR, N. S
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Samples of polymethylmethacrylate have been irradiated with laser pulses of 266 nm wavelength along with the wavelengths generated via hydrogen-shifted stimulated Raman scattering. A quadrupole mass spectrometer monitors in real time the photoablation products produced during the irradiation. At wavelengths of 266 nm and above, the products are dominated by monomer, CO2, and CO. At wavelengths below 266 nm, a dramatic change of ablation products is observed, with methyl formate appearing as a major photochemical product.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.97406