Phase transformation on and charged particle emission from a silicon crystal surface, induced by picosecond laser pulses

Ultrafast melting and resolidification on a (111) sufarce of a silicon crystal wafer, induced by 20-ps pulses at 532-nm wavelength, is accompanied by the emission of charged particles. This emission is studied as a function of pulse energy, in combination with time-resolved reflectivity changes and...

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Veröffentlicht in:Applied physics letters 1981-11, Vol.39 (9), p.755-757
Hauptverfasser: Liu, J. M., Yen, R., Kurz, H., Bloembergen, N.
Format: Artikel
Sprache:eng
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Zusammenfassung:Ultrafast melting and resolidification on a (111) sufarce of a silicon crystal wafer, induced by 20-ps pulses at 532-nm wavelength, is accompanied by the emission of charged particles. This emission is studied as a function of pulse energy, in combination with time-resolved reflectivity changes and post-annealing morphology. The data provide evidence that thermalization time for a dense carrier plasma and the lattice is shorter than 10−11 s.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.92843