Phase transformation on and charged particle emission from a silicon crystal surface, induced by picosecond laser pulses
Ultrafast melting and resolidification on a (111) sufarce of a silicon crystal wafer, induced by 20-ps pulses at 532-nm wavelength, is accompanied by the emission of charged particles. This emission is studied as a function of pulse energy, in combination with time-resolved reflectivity changes and...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 1981-11, Vol.39 (9), p.755-757 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Ultrafast melting and resolidification on a (111) sufarce of a silicon crystal wafer, induced by 20-ps pulses at 532-nm wavelength, is accompanied by the emission of charged particles. This emission is studied as a function of pulse energy, in combination with time-resolved reflectivity changes and post-annealing morphology. The data provide evidence that thermalization time for a dense carrier plasma and the lattice is shorter than 10−11 s. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.92843 |