Photoelectrochemical deposition of microscopic metal film patterns on Si and GaAs

Photoelectrochemical deposition of microscopic metal film patterns on Si and GaAs

Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd, and Au films was investigated. Resolution exceeding 10 μ has been achieved for deposits of Au on p-GaAs and Cu on...

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Veröffentlicht in:Applied physics letters 1981-09, Vol.39 (5), p.418-420
Hauptverfasser: Micheels, Ronald H., Darrow, Allan D., Rauh, R. David
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container_title Applied physics letters
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creator Micheels, Ronald H.
Darrow, Allan D.
Rauh, R. David
description Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd, and Au films was investigated. Resolution exceeding 10 μ has been achieved for deposits of Au on p-GaAs and Cu on p-Si.
doi_str_mv 10.1063/1.92758
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title Photoelectrochemical deposition of microscopic metal film patterns on Si and GaAs
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