Photoelectrochemical deposition of microscopic metal film patterns on Si and GaAs

Photoelectrochemical deposition of microscopic metal film patterns on Si and GaAs

Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd, and Au films was investigated. Resolution exceeding 10 μ has been achieved for deposits of Au on p-GaAs and Cu on...

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Veröffentlicht in:Applied physics letters 1981-09, Vol.39 (5), p.418-420
Hauptverfasser: Micheels, Ronald H., Darrow, Allan D., Rauh, R. David
Format: Artikel
Sprache:eng
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Zusammenfassung:Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd, and Au films was investigated. Resolution exceeding 10 μ has been achieved for deposits of Au on p-GaAs and Cu on p-Si.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.92758