Epitaxially grown Cu2Sb-type MnGaGe films with large perpendicular magnetic anisotropy

A perpendicularly magnetized film is essentially important for spintronics applications, such as spin-transfer-torque type magnetoresistive random access memories, STT-MRAMs, and large perpendicular anisotropy energy, K u, with small saturation magnetization, M s, is required for reducing the critic...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2020-02, Vol.116 (6), Article 062402
Hauptverfasser: Sun, Mingling, Kubota, Takahide, Ito, Keita, Takahashi, Shigeki, Hirayama, Yoshiyuki, Sonobe, Yoshiaki, Takanashi, Koki
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A perpendicularly magnetized film is essentially important for spintronics applications, such as spin-transfer-torque type magnetoresistive random access memories, STT-MRAMs, and large perpendicular anisotropy energy, K u, with small saturation magnetization, M s, is required for reducing the critical current for the STT induced magnetization switching phenomenon. In this study, an equiatomic intermetallic compound, MnGaGe, was investigated in epitaxially grown film samples. Perpendicularly magnetized films with an M s value of about 260 emu/cm3 at 300 K were fabricated onto MgO (100) single crystal substrates. The maximum value of K u was 8.1 × 106 erg/cm3 at room temperature. Microstructure analysis using a scanning transmission electron microscope atomically revealed the Cu2Sb type crystal structure in the film sample. First principles calculations were also carried out to discuss the electronic structure. Using the analysis of the projected density of states for 3d-orbitals, the hybridization of the 3d-orbitals was suggested as a possible factor for promoting magnetocrystalline anisotropy. The MnGaGe film with the large K u and relatively small M s would be potentially used for spintronics applications.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.5140398