Fabrication and characterization of reduced graphene oxide by atmospheric pressure plasma jet

A low-cost and fast reduction method for the fabrication of reduced graphene oxide (r-GO) by using a dielectric barrier discharge plasma jet under atmospheric pressure has been presented. Highly reduced r-GO with the carbon atomic ratio up to 87.43% is obtained in minutes. By using diagnostic instru...

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Veröffentlicht in:AIP advances 2020-01, Vol.10 (1), p.015216-015216-6
Hauptverfasser: Zhao, Ying, Chen, Longwei, Meng, Yuedong
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Sprache:eng
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Zusammenfassung:A low-cost and fast reduction method for the fabrication of reduced graphene oxide (r-GO) by using a dielectric barrier discharge plasma jet under atmospheric pressure has been presented. Highly reduced r-GO with the carbon atomic ratio up to 87.43% is obtained in minutes. By using diagnostic instruments like XRD, Raman, scanning electron microscopy, transmission electron microscopy, FT-IR, and X-ray photoelectron spectroscopy, the morphology, chemical, and structural properties of r-GO are analyzed. Due to the relatively high bonding energy, the functional group of C—O—C is the dominant structure in r-GO. By using N2 adsorption-desorption measurements, the specific surface area is calculated to be about 145 m2 g−1. The porosity results indicate that r-GO is a mesoporous structure with the pore size ranging from 3 nm to 4 nm.
ISSN:2158-3226
2158-3226
DOI:10.1063/1.5136285