Physical properties of nanometer graphene oxide films partially and fully reduced by annealing in ultra-high vacuum

Physical properties of nanometer graphene oxide films partially and fully reduced by annealing in ultra-high vacuum

The properties of reduced graphene oxide (GO) are reported from a non-chemical reduction method. Ultra-high vacuum annealing of GO films in the thickness of 1–80 nm was studied by XPS, AFM, UV-Vis-NIR, Raman, and TEM to observe the controlled removal of oxygen. We observed the loss of hydroxyl (C-OH...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 2017-08, Vol.122 (7)
Hauptverfasser: Jernigan, Glenn G., Nolde, Jill A., Mahadik, Nadeem A., Cleveland, Erin R., Boercker, Janice E., Katz, Michael B., Robinson, Jeremy T., Aifer, Edward H.
Format: Artikel
Sprache:eng
Schlagworte:
Applied physics
Carbonyls
Chemical reduction
Epitaxial growth
Graphene
High vacuum
Organic chemistry
Oxide coatings
Physical properties
Raman spectroscopy
Spectrum analysis
Thickness
Vacuum annealing
X ray photoelectron spectroscopy
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The properties of reduced graphene oxide (GO) are reported from a non-chemical reduction method. Ultra-high vacuum annealing of GO films in the thickness of 1–80 nm was studied by XPS, AFM, UV-Vis-NIR, Raman, and TEM to observe the controlled removal of oxygen. We observed the loss of hydroxyl (C-OH) at low temperatures (
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4998812