Few-layer SnSe2 transistors with high on/off ratios

We report few-layer SnSe2 field effect transistors (FETs) with high current on/off ratios. By trying different gate configurations, 300 nm SiO2 and 70 nm HfO2 as back gate only and 70 nm HfO2 as back gate combined with a top capping layer of polymer electrolyte, few-layer SnSe2 FET with a current on...

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Veröffentlicht in:Applied physics letters 2016-02, Vol.108 (5)
Hauptverfasser: Pei, Tengfei, Bao, Lihong, Wang, Guocai, Ma, Ruisong, Yang, Haifang, Li, Junjie, Gu, Changzhi, Pantelides, Sokrates, Du, Shixuan, Gao, Hong-jun
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Sprache:eng
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Zusammenfassung:We report few-layer SnSe2 field effect transistors (FETs) with high current on/off ratios. By trying different gate configurations, 300 nm SiO2 and 70 nm HfO2 as back gate only and 70 nm HfO2 as back gate combined with a top capping layer of polymer electrolyte, few-layer SnSe2 FET with a current on/off ratio of 104 can be obtained. This provides a reliable solution for electrically modulating quasi-two-dimensional materials with high electron density (over 1013 cm−2) for field-effect transistor applications.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4941394