Double oxide deposition and etching nanolithography for wafer-scale nanopatterning with high-aspect-ratio using photolithography

We report a nanolithography technique for the high aspect-ratio nanostructure manufacturing using DODE (double oxide deposition and etching) process. Conventional microfabrication processes are integrated to manufacture nanostructure arrays with sub-100 nm of linewidth. This lithography method is de...

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Veröffentlicht in:	Applied physics letters 2013-07, Vol.103 (3)
Hauptverfasser:	Seo, Jungho, Cho, Hanchul, Lee, Ju-kyung, Lee, Jinyoung, Busnaina, Ahmed, Lee, HeaYeon
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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